The Wafer Profiler CVP21 is a handy tool to measure doping profiles in semiconductor layers by Electrochemical Capacitance Voltage Profiling (ECV-Profiling, CV-Profiling) in semiconductor research or production. This ECV Profiler
The Wafer Profiler CVP21 is a handy tool to measure doping profiles in semiconductor layers by Electrochemical Capacitance Voltage Profiling (ECV-Profiling, CV-Profiling) in semiconductor research or production. This ECV Profiler (CV-Profiler, C-V-Profiler) furthermore is a very good choice to analyze or develop strategies for Photo-Electrochemical Wet Etching (PEC-Etching) of semiconductors.
CVP21 is the COMPLETE SOLUTION:
CVP21 supports theCOMPLETE spectrum of materials:
Group IV semiconductors as Silicon (Si), Germanium (Ge), Silicon Carbide (SiC), or
III-V semiconductors as Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), ..., or
ternary III-V alloys as Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminium Indium Arsenide (AlInAs) ..., or
quaternary III-V alloys as Aluminum Gallium Indium Phosphide (AlGaInP), ..., or
Nitrides, as Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN) or Aluminum Indium Nitride (AlInN), or
II-VI semiconductors as Zinc Oxide (ZnO), Cadmium Telluride (CdTe), Mercury Cadmium Telluride (HgCdTe, MCT)..., or
less commonly used semiconductors (please contact us for sample measurements).
CVP21 supports the COMPLETE sample range:
Stacked layers are no problem (the material, the doping and the doping type may vary).
No Restrictions concerning the substrate (may be conductive or insulating).
Sample size: 4*2 mm?to complete 8" wafer sizeare standard (smaller samples on request).
CVP21 supports the COMPLETE resolution range:
Concentration resolution < 1012 cm-3 to > 1021 cm-3(*).
Depth resolution 1 nm to 100 祄 (*).
(*) may depend on material type/ sample quality. Please ask for sample measurements
CVP21 comes as a COMPLETE measurement system:
High Reliability system (special concern on electronics, mechanics, optics and fluid system).
Calibration-free system (Complete self calibrating electronic system - no needs for cable capacitance calibration).
Easy-to-use (Software optimized with full user management - easily used as well in production as in laboratory environment).
Wafer-Stepping (Complete wafer stepper is optionally available - to process several measurements on a wafer in full automation).
Camera-Control (The process is controlled on-line by a color camera - after each measurement camera data is available in film strip format).
Recipes (Measurement recipes are pre-defined and may easily modified by a user with higher priority).
Dry-In / Dry-Out: Auto-Load / Unload / Reload (The loading/ un-loading and re-loading of the electrochemical cell is automated and may be easily modified by a user with higher priority. The samples are processed dry-in
